Title of article :
Some annealing effects on r.f. sputtered Cu/Te/CdTe structure
Author/Authors :
Debbagh، نويسنده , , F. and Ameziane، نويسنده , , E.L. and Azizan، نويسنده , , M. and Brunel، نويسنده , , M. and Nguyen، نويسنده , , T.T.A.، نويسنده ,
Pages :
5
From page :
223
To page :
227
Abstract :
Cu/Te/CdTe multilayers prepared entirely by r.f. sputtering on silicon substrates are investigated using grazing incidence X-ray diffraction (GIXD) and X-ray photoelectron spectroscopy (XPS) techniques. Migration of cadmium atoms from the CdTe layer to the free surface is observed when the films are annealed at 450 K. This migration is accompanied by the diffusion of copper and tellurium into the CdTe layer, leading to segregation of these two elements at the CdTe/Si interface.
Keywords :
diffusion , Copper , Cadmium telluride r.f. sputtering
Journal title :
Astroparticle Physics
Record number :
2065574
Link To Document :
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