Preparation and characterization of highly c-axis-oriented Bi4Ti3O12 thin films

Highly c-axis-oriented bismuth litanale (Bi4Ti3O12) thin films were prepared on (100)-oriented silicon wafers by rf planar magnetron sputtering using a target of Bi2TiO5 ceramic at a low substrate temperature of 600 °C. The films with a c-axis orientation up to 99%. were obtained under high deposition rate approximately 1.1 μm h 1. Dielectric constant of these films were dependence of film thickness. This behavior was explained assuming a low-dielectric-constant interface layer. Using this assumption, the dielectric constant of Bi4Ti3O12 film was estimated to be approximately 140. This value is similar to that along the c-axis in a bulk form. A D E hysteresis characteristic has been observed at room temperature. The remanent polarisation and the coercive field are 0.8 μC cm 2 and 20 kV cm 1. respectively. From analysis of refractive index, interface layer was confirmed an oxidixed silicon, which was formed before and or during film deposition.