Numerical study and optimization of chemical vapor deposition process in fabricating zinc selenide films
Author/Authors :
Vorobʹev، نويسنده , , A.N. and Garibin، نويسنده , , E.A. and Khoruzhnikov، نويسنده , , S.E. and Mironov، نويسنده , , I.A.، نويسنده ,
Pages :
6
From page :
204
To page :
209
Abstract :
The numerical study and optimization of chemical vapor deposition process in fabricating zinc selenide films were carried out on the basis of the three-dimensional transport equations for low Mach number flows. The optimization technics was developed and the optimum regimes were found.
Keywords :
chemical vapor deposition , Zinc selenide , optimization
