Author/Authors :
Koster، نويسنده , , Gertjan and Kropman، نويسنده , , Boike L. and Rijnders، نويسنده , , Guus J.H.M. and Blank، نويسنده , , Dave H.A. and Rogalla، نويسنده , , Horst، نويسنده ,
Abstract :
In order to study the homoepitaxial growth of SrTiO3, several techniques have been used to obtain atomically flat surfaces. Here, the effect of annealing in an oxygen environment and etching in a buffered HF solution on the surface morphology is studied by atomic force microscopy and reflection high-energy electron diffraction. We will show the effect of these substrate treatments on the initial growth of SrTiO3.
Keywords :
Oxide , Surface treatment , PLD , RHEED
