Title of article :
Dielectric properties of nc-Si/CaF2 multi quantum wells
Author/Authors :
Ioannou-Sougleridis، نويسنده , , Evi Tsakiri، نويسنده , , A.G. Nassiopoulou، نويسنده , , A.G and Bassani، نويسنده , , F and Menard، نويسنده , , S and d’Avitaya، نويسنده , , F.Arnaud، نويسنده ,
Pages :
5
From page :
309
To page :
313
Abstract :
Admittance measurements were performed on nc-Si/CaF2 multi quantum wells (MQWs) with 50 periods, over the temperature range 75–320 K. Nominal CaF2 thickness in each bilayer was in the range of 1.4–2.8 nm and Si thickness was equal to 1.6 nm. The structure exhibited capacitive behavior, similar to that of a metal–insulator–semiconductor (MIS) structure. All the experimental results indicate that carrier injection takes place, leading to charge build-up within MQWs. This charge is able to move under electric fields, forming a reversible space charge. Its transport is strongly temperature dependent. From the conductance–voltage characteristics two carrier exchange mechanisms were identified and they will be discussed.
Keywords :
nc-Si/CaF2 , Multi quantum wells , Capacitance–voltage measurements
Journal title :
Astroparticle Physics
Record number :
2068165
Link To Document :
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