Title of article
Fabrication of NiO/Bi2Sr2CaCu2Ox hetero-structure by a DC hollow cathode sputtering
Author/Authors
Moriya، نويسنده , , M. and Suzuki، نويسنده , , R. and Kobayashi، نويسنده , , T. and Goto، نويسنده , , T.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 1995
Pages
2
From page
1595
To page
1596
Abstract
NiO was attempted to be used as a barrier material for high-Tc tunnel junction. BSCCO films were deposited on MgO(100) or SrTiO3(110) using a dc hollow cathode sputtering. As-grown superconducting BSCCO film was obtained at Ts = 700°C on MgO, and was c-axis oriented. The crystallinity of NiO films, which were deposited on c-axis oriented BSCCO films at various temperature, were investigated. NiO deposited at the temperature above 600°C was dominantly (100) oriented. The nonlinearity was observed in the I - V characteristics of Ag/NiO(4nm)/BSCCO junction.
Journal title
Synthetic Metals
Serial Year
1995
Journal title
Synthetic Metals
Record number
2069482
Link To Document