Title of article :
Photolithographic patterning of the charge-density-wave conductor Rb0.30MoO3
Author/Authors :
van der Zant، نويسنده , , H.S.J. and Mantel، نويسنده , , O.C. and Heij، نويسنده , , C.P. and Dekker، نويسنده , , C.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 1997
Abstract :
We report on the first photolithographic patterning of a charge-density wave (CDW) film. Electrical transport measurements on 2 μm structures patterned in Rb0.30MoO3 films reveal the expected Peierls transition near 180 K. Nonlinear current-voltage characteristics demonstrate the sliding of CDWs. Patterned structures permit unprecedented studies of mesoscopic, phase-coherent CDW transport as well as the exploration of devices based on CDWs.
Keywords :
Thin films , Charge-density waves , Transport measurements
Journal title :
Synthetic Metals
Journal title :
Synthetic Metals
