Title of article :
Incorporation of selenium into carbon films by chemical vapor deposition
Author/Authors :
Mendoza، نويسنده , , D. and Lَpez، نويسنده , , S. and Granandos، نويسنده , , S. and Morales، نويسنده , , F. Javier Escudero Sanz، نويسنده , , R.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 1997
Pages :
2
From page :
71
To page :
72
Abstract :
The introduction of selenium into carbon thin films was tried by a chemical vapor deposition (CVD) from selenium and acrylic acid vapors at 900 °C on different substrates. No conclusive evidence of intercalation of selenium into the carbon films was obtained, but the materials contained a small quantity of selenium. Electrical conductivity of the film deposited on a silicon wafer was four times higher than that on a quartz glass.
Keywords :
Carbon films , Thin films , chemical vapour deposition , Selenium
Journal title :
Synthetic Metals
Serial Year :
1997
Journal title :
Synthetic Metals
Record number :
2071528
Link To Document :
بازگشت