Incorporation of selenium into carbon films by chemical vapor deposition

The introduction of selenium into carbon thin films was tried by a chemical vapor deposition (CVD) from selenium and acrylic acid vapors at 900 °C on different substrates. No conclusive evidence of intercalation of selenium into the carbon films was obtained, but the materials contained a small quantity of selenium. Electrical conductivity of the film deposited on a silicon wafer was four times higher than that on a quartz glass.