Author/Authors :
Pisignano، نويسنده , , Dario and Persano، نويسنده , , Luana and Babudri، نويسنده , , Francesco and Farinola، نويسنده , , Gianluca M. and Naso، نويسنده , , Francesco and Cingolani، نويسنده , , Roberto and Gigli، نويسنده , , Giuseppe، نويسنده ,
Abstract :
Sub micron patterning of the conjugated polymer, poly-[2-methoxy-5-(2′-ethyl-hexiloxy)-p-phenylenevinylene] (MEH-PPV) has been achieved by high-temperature soft lithography. The process has been carried out by placing a spin-coated polymer film in conform
