• Title of article

    Atomic layer epitaxy

  • Author/Authors

    Niinistِ، نويسنده , , Lauri، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    6
  • From page
    147
  • To page
    152
  • Abstract
    Atomic layer epitaxy is now a mature technique offering, through its self-limiting character, distinct advantages for materials processing especially when precise layer thickness control or conformal coating is needed. The technique is well suited for binary compounds and their doping but it is also applicable to more complex thin film structures. With a broadening range of materials processed by atomic layer epitaxy, new applications are emerging in electronics, optics and catalysis.
  • Keywords
    ALE atomic layer epitaxy , SILAR successive ionic layer adsorption and reaction , ECALE electrochemical atomic layer epitaxy , TFEL thin film electroluminescence , YBCO YBa2Cu3O7?x
  • Journal title
    Current Opinion in Solid State and Materials Science
  • Serial Year
    1998
  • Journal title
    Current Opinion in Solid State and Materials Science
  • Record number

    2088360