Title of article
Atomic layer epitaxy
Author/Authors
Niinistِ، نويسنده , , Lauri، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
147
To page
152
Abstract
Atomic layer epitaxy is now a mature technique offering, through its self-limiting character, distinct advantages for materials processing especially when precise layer thickness control or conformal coating is needed. The technique is well suited for binary compounds and their doping but it is also applicable to more complex thin film structures. With a broadening range of materials processed by atomic layer epitaxy, new applications are emerging in electronics, optics and catalysis.
Keywords
ALE atomic layer epitaxy , SILAR successive ionic layer adsorption and reaction , ECALE electrochemical atomic layer epitaxy , TFEL thin film electroluminescence , YBCO YBa2Cu3O7?x
Journal title
Current Opinion in Solid State and Materials Science
Serial Year
1998
Journal title
Current Opinion in Solid State and Materials Science
Record number
2088360
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