Title of article
Amorphisation processes in silicon
Author/Authors
Müller، نويسنده , , Gerhard، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
7
From page
364
To page
370
Abstract
Amorphisation damage, a by-product of the ion-implantation process, has plagued silicon device technologists for more than three decades. More recently, physicists have become aware of the fact that ion bombardment of amorphised silicon represents an ideal model system for elucidating fundamental properties of both pure and hydrogenated silicon random networks.
Journal title
Current Opinion in Solid State and Materials Science
Serial Year
1998
Journal title
Current Opinion in Solid State and Materials Science
Record number
2088412
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