Title of article :
X-ray diffraction at elevated temperatures: A method for in situ process analysis: By D. D. L. Chung, P. W. DeHaven, H. Arnold, and Debashis Ghosh. VCH Publishers, New York, 1993, 268 pages, price $95
Author/Authors :
Nassau، نويسنده , , Kurt، نويسنده ,
