Title of article :
Effect of concentration of complexing agent (tartaric acid) on spray-deposited Bi2S3 films
Author/Authors :
S.R Gadakh، نويسنده , , S.R. and Bhosale، نويسنده , , C.H، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
10
From page :
1097
To page :
1106
Abstract :
Bi2S3 thin films were prepared without complexing agent and with different concentrations of tartaric acid as a complexing agent by a spray pyrolysis technique. The effect of concentration of the complexing agent on the properties of Bi2S3 thin films was studied by characterizing the films by X-ray diffraction, scanning electron microscopy, optical absorption, and dark electrical resistivity measurement techniques. These studies revealed that all films were polycrystalline. The band gap energy for films grown without complexing agent was observed to be 1.72 eV. However, the band gap energy for different concentrations of complexing agent was observed to be 2.0 eV. The electrical resistivity of the films with complexing agent was higher than that of the film prepared without complexing agent. The electrical resistivity increased with increasing concentration of complexing agent.
Keywords :
A. Thin films , A. Semiconductors , C. X-ray diffraction , C. Electron microscopy , B. Chemical synthesis
Journal title :
Materials Research Bulletin
Serial Year :
2000
Journal title :
Materials Research Bulletin
Record number :
2094876
Link To Document :
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