Attempts of boron nitride deposition on different substrates under the influence of the electric field present in the reaction zone

Attempts were undertaken to obtain deposits of hexagonal boron nitride under the influence of either the electric field or current of various frequency flowing through the substrate. It was demonstrated that magnetic field as well as electrical potential difference created in the reaction zone both influence the way BN layers are formed. The layers grow with the formation of fine crystallites in the center of the substrate with their size increasing while moving from the center of the substrate to its edges. Distinct correlation between the electric fields line density and the sizes of the crystallites was observed. The distribution of the crystallites depends on current frequency used. It was found that there is an optimal current frequency for which the substrate is covered with the homogeneous layer of BN. The adhesion of this deposit depends strongly on the kind of the substrate used.