Title of article
Microstructure and elemental distribution of multicrystal Ag/Cu interface in bimetallic strips with diffusion treatment
Author/Authors
Meng، نويسنده , , L and Zhou، نويسنده , , S.P. and Yang، نويسنده , , F.T. and Lin، نويسنده , , D.Z، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
7
From page
1729
To page
1735
Abstract
The Ag/Cu bimetallic sheets prepared by roll cladding at ambient temperature were diffusion annealed for different time at 750°C. The dependence of microstructure and element distribution in the Ag/Cu interface region on the annealing time was investigated. There was an evident recrystallization with the coarsened grains in the interface region when the composite sheets were annealed only for 0.5 h. With prolonging the annealing time, the width of the Cu diffusion region in the Ag side increased because the migration of Cu atoms passing through the original interface into the Ag side was faster than the reverse migration of Ag atoms into the Cu side. A fine-grain area appeared in the Cu diffusion region in the Ag side, especially for the composite sheets annealed for a longer time and some Cu-rich particles precipitated along the grain boundaries in the fine-grain area.
Keywords
A. Multilayers , D. Microstructure , D. Diffusion , A. Interfaces
Journal title
Materials Research Bulletin
Serial Year
2001
Journal title
Materials Research Bulletin
Record number
2095405
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