Title of article :
Interconnection of specific nano-objects by electron beam lithography — A controllable method
Author/Authors :
Della Torre، نويسنده , , A. and Pompa، نويسنده , , P.P. and Mercato، نويسنده , , L.L. del and Chiuri، نويسنده , , R. and Krahne، نويسنده , , R. and Maruccio، نويسنده , , G. and Carbone، نويسنده , , L. and Manna، نويسنده , , L. and Cingolani، نويسنده , , R. and Rinaldi، نويسنده , , R. and Shankar، نويسنده , , S. Shiv and Sastry، نويسنده , , M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
299
To page :
302
Abstract :
We report a widely applicable and highly controlled approach, based on electron beam lithography (EBL), to interconnect single nano-objects, previously immobilized onto solid surfaces, and to investigate the transport properties at the level of single nanostructures. In particular, a three-step EBL-procedure was used for this purpose by patterning two planar contacts on the sides of an individual nano-object. To demonstrate this approach, we use two different kinds of active elements: a semiconductor nanocrystal (tetrapod) and a thin triangular gold nanoprism (NT).
Keywords :
Electron beam lithography , molecular electronics , Nanotechnology
Journal title :
Materials Science and Engineering C
Serial Year :
2008
Journal title :
Materials Science and Engineering C
Record number :
2096764
Link To Document :
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