Title of article :
Synthesis and characterization of boron–oxygen–hydrogen thin films at low temperatures
Author/Authors :
Music، نويسنده , , D. and Kِlpin، نويسنده , , H. and Atiser، نويسنده , , A. and Kreissig، نويسنده , , U. and Bobek، نويسنده , , T. and Hadam، نويسنده , , B. and Schneider، نويسنده , , J.M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
We have studied the influence of synthesis temperature on chemical composition and mechanical properties of X-ray amorphous boron–oxygen–hydrogen (B–O–H) films. These B–O–H films have been synthesized by RF sputtering of a B-target in an Ar atmosphere. Upon increasing the synthesis temperature from room temperature to 550 °C, the O/B and H/B ratios decrease from 0.73 to 0.15 and 0.28 to 0.07, respectively, as determined by elastic recoil detection analysis. It is reasonable to assume that potential sources of O and H are residual gas and laboratory atmosphere. The elastic modulus, as measured by nanoindentation, increases from 93 to 214 GPa, as the O/B and H/B ratios decreases within the range probed. Hence, we have shown that the effect of impurity incorporation on the elastic properties is extensive and that the magnitude of the incorporation is a strong function of the substrate temperature.
Keywords :
D. Mechanical properties , B. Sputtering , A. Amorphous materials
Journal title :
Materials Research Bulletin
Journal title :
Materials Research Bulletin