Title of article :
The use of dithio- and diselenocarbamates as precursors to nanoscale materials
Author/Authors :
Robert C. Lazell، نويسنده , , Mike and Nّrager، نويسنده , , Sebastian J and OʹBrien، نويسنده , , Paul and Revaprasadu، نويسنده , , N، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
129
To page :
133
Abstract :
The effectiveness of dithio- and diselenocarbamates of several metals as precursors for a range of nanoscale semiconducting materials has been demonstrated. Tailoring the precursor alkyl groups, can lead to: self-capping quantum dots, size selection (growth time and temperature) and clean decomposition. Here we report the different outcomes achieved when using the dithio- and diselenocarbamates, [E2CNMenHex] analogue as opposed to the [E2CNMenOctadecyl] compounds. studies using [Cd(Se2CNMenHex)2] showed that there is initially linear growth in the average diameter of the nanoparticles in trioctylphosphine oxide (TOPO at 250 °C). However, for precursor such as [Bi(S2CNMenOctadecyl)3], a radically different approach can be taken. These long chain dithiocarbamates can be used to synthesise self-capped quantum dots, via a simple thermolysis reaction.
Keywords :
Tri-n-octylphosphine oxide (TOPO) , Semiconductors , Diselenocarbamates , dithiocarbamates
Journal title :
Materials Science and Engineering C
Serial Year :
2001
Journal title :
Materials Science and Engineering C
Record number :
2097477
Link To Document :
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