Title of article :
Resonant tunnelling leakage in planar metal–oxide–metal nanojunctions
Author/Authors :
Maruccio، نويسنده , , G. and Visconti، نويسنده , , P. and Calogiuri، نويسنده , , P. and DʹAmone، نويسنده , , E. and Cingolani، نويسنده , , R. and Rinaldi، نويسنده , , R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
1039
To page :
1042
Abstract :
The leakage–current in planar nanojunctions, usually employed to realize molecular field-effect devices, is investigated. Resonances are observed on p-doped substrates when the voltage drop between drain and gate electrodes is around 1.1 V. These resonances are related to resonant tunneling via impurity atoms and are otherwise not observed on n-type substrates.
Keywords :
NANOTECHNOLOGY , Downsizing , Leakage
Journal title :
Materials Science and Engineering C
Serial Year :
2003
Journal title :
Materials Science and Engineering C
Record number :
2098228
Link To Document :
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