Title of article :
Submicro photopatterning of alkanethiolate self-assembled monolayer using a negative mask and its application in the fabrication of biomolecular photodiode
Author/Authors :
Oh، نويسنده , , Se-Young and Choi، نويسنده , , Hyung Seok and Jie، نويسنده , , Hang Sok and Park، نويسنده , , Je-Kyun Park ، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
91
To page :
94
Abstract :
Alkanethiolate self-assembled monolayer (SAM) formed by the adsorption of 11-mercaptoundecanoic acid (11-MUDA) molecules on a gold substrate. The alkanethiolate was oxidized by the irradiation of deep UV light with a 700-nm negative mask and then developed with a deionized water. A uniform submicro-pattern of 11-MUDA SAM was obtained. In order to array cytochrome c molecules along the patterned substrate, the well-characterized cytochrome c was immobilized. Electrochemical properties and morphology of the cytochrome c monolayer were investigated through the measurements of cyclic voltammetry and AFM. In addition, current–voltage characteristics of biomolecular multilayers consisting of cytochrome c and green fluorescent protein (GFP) were studied with a scanning tunneling microscope (STM).
Keywords :
cytochrome c , Current–voltage characteristics , Alkanethiolate self-assembled monolayer , Electrochemical Property , Submicro-pattern
Journal title :
Materials Science and Engineering C
Serial Year :
2004
Journal title :
Materials Science and Engineering C
Record number :
2098315
Link To Document :
بازگشت