Title of article
Photolithographic process of microcapsule sheet for electrophoretic display
Author/Authors
Park، نويسنده , , Lee Soon and Choi، نويسنده , , Hyung-Suk and Kim، نويسنده , , Woo-Sik and Lee، نويسنده , , Dong-Ho and Min، نويسنده , , Kyung-Eun and Seo، نويسنده , , Kwan-Ho and Kyu Kang، نويسنده , , Inn and Park، نويسنده , , Soo-Young and Ho Hwang، نويسنده , , Sung and Kwon، نويسنده , , Younghwan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
4
From page
143
To page
146
Abstract
A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50–80 μm and gap between ribs of 100–150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.
Keywords
Electrophoretic display , Barrier ribs , Photolithographic process
Journal title
Materials Science and Engineering C
Serial Year
2004
Journal title
Materials Science and Engineering C
Record number
2098340
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