Author/Authors :
Villanueva، نويسنده , , G. and Plaza، نويسنده , , J.A. and Sلnchez-Amores، نويسنده , , A. and Bausells، نويسنده , , J. and Martيnez، نويسنده , , E. and Samitier، نويسنده , , J. and Errachid، نويسنده , , A.، نويسنده ,
Abstract :
We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called “rocket tips” which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a focused ion beam to obtain nanotips at their apex. Typical results obtained are nanotips with a basis radius of 200 nm and a height of 2.5 μm, with an apex radius of 5 nm, located on top of a 3 μm wide and 9 μm high silicon column. The process would allow however obtaining column heights of several tens of microns.
