Formation of amine functionalized films by chemical vapour deposition

Thermally Activated Chemical Vapour Deposition (TA-CVD) has been used for the biofunctionalization of silicon substrates, among others. This technique uses 3-aminopropyltriethoxysilane as organometallic precursor. The deposited films show biofunctional properties, with reactive amines on the surface, as it was shown by FTIR and confocal microscopy. In this work, the influence of the deposition parameters in the microstructure and functionality of the films was investigated. Antibodies were immobilized on the films that had higher and more homogeneous distribution of amines. The confocal microscopy images show that the amines react with the antibodies and that these biomolecules keep their biological functionality.