• Title of article

    Cathodoluminescence study in AlxGa1 − xN structures

  • Author/Authors

    Nasr، نويسنده , , F. Ben and Matoussi، نويسنده , , A. and Guermazi، نويسنده , , S. and Fakhfakh، نويسنده , , Z.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    5
  • From page
    618
  • To page
    622
  • Abstract
    In this work, we consider a 2D model for calculation of cathodoluminescence in GaN-based structures. This model is developed using an extended generation profile and taking into account the influence of the carrier diffusion process, internal absorption and some radiative recombination processes. First, we have investigated the effect of hole diffusion length and the surface recombination velocity on the CL spectra of GaN sample grown at 800 °C by MOVPE method. Then, we have calculated the dependence of CL intensity from AlGaN alloys as a function of Al content and the electron beam energy. s show a red shift of the CL peaks when the beam energy is varied from 2 to 10 keV at room temperature. The band-edge emission of AlxGa1 − xN shifts about 0.49 eV when the Al composition is increased from x = 0.18 to 0.38. Comparison of the experimental spectra with simulations shows a good agreement.
  • Keywords
    diffusion length , cathodoluminescence , Recombination , nitrides , Photoluminescence
  • Journal title
    Materials Science and Engineering C
  • Serial Year
    2008
  • Journal title
    Materials Science and Engineering C
  • Record number

    2099364