Title of article
Epitaxial growth of asymmetric α-silicon nitride nanocombs
Author/Authors
Wang، نويسنده , , Qiushi and Cui، نويسنده , , Qiliang and Zhu، نويسنده , , Pinwen and Jin، نويسنده , , Yinxia and Hao، نويسنده , , Jian and Zhang، نويسنده , , Jian، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
4
From page
888
To page
891
Abstract
The asymmetric α-Si3N4 nanocombs have been prepared by direct current arc discharge method without the addition of any catalyst or template. The nanocombs are composed of closely packed Si3N4 nanowires, which grow perpendicular to the central axial nanorods in an epitaxial manner. The growth mechanism of the α-Si3N4 nanocombs can be considered as a combination of the vapor–solid mechanism and the secondary epitaxial nucleation process. The photoluminescence spectra of the nanocombs show a strong blue light emission peak at about 424 nm.
Keywords
A. Nitrides , B. Epitaxial growth , C. Scanning tunneling microscopy , D. Optical properties
Journal title
Materials Research Bulletin
Serial Year
2010
Journal title
Materials Research Bulletin
Record number
2100171
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