Title of article :
Electrochemical behavior of potentiodynamically deposited cobalt oxyhydroxide (CoOOH) thin films for supercapacitor application
Author/Authors :
Jagadale، نويسنده , , A.D. and Dubal، نويسنده , , D.P. and Lokhande، نويسنده , , C.D.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
5
From page :
672
To page :
676
Abstract :
In the present study, we report, for the first time, the synthesis of cobalt oxyhydroxide thin films on inexpensive stainless steel substrate using potentiodynamic electrodeposition method. These films were characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR) and scanning electron microscopy (SEM) techniques. The orthorhombic crystal structure was revealed by the X-ray diffraction study. The FT-IR spectrum confirmed the formation of cobalt oxyhydroxide. The SEM studies showed the nanoflakes-like morphology with an average thickness of 100 nm. The cyclic voltammetry study of the cobalt oxyhydroxide films in 1 M KOH showed maximum specific capacitance of 449 F g−1 at scan rate of 5 mV s−1.
Keywords :
C. electrochemical measurements , A. Thin film , B. Chemical synthesis
Journal title :
Materials Research Bulletin
Serial Year :
2012
Journal title :
Materials Research Bulletin
Record number :
2101672
Link To Document :
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