Title of article
Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium
Author/Authors
Hertl، نويسنده , , C. and Koll، نويسنده , , L. and Schmitz، نويسنده , , T. and Werner، نويسنده , , Jake E. and Gbureck، نويسنده , , U.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2014
Pages
8
From page
28
To page
35
Abstract
Titanium substrates were coated with tantalum layers of 5 μm thickness using physical vapour deposition (PVD). The tantalum layers showed a (110)-preferred orientation. The coated samples were hardened by oxygen diffusion. Using X-ray diffraction the crystallographic structure of the tantalum coatings was characterised, comparing untreated and diffusion hardened specimen conditions. Oxygen depth profiles were determined by glow discharge spectrometry. The hardening effect of the heat treatment was examined by Vickers microhardness testing. The increase of surface hardness caused by oxygen diffusion was at least 50%.
Keywords
diffusion , Oxidation , Surface hardening , Magnetron sputtering , Physical vapour deposition , Metal surface treatment , Titanium
Journal title
Materials Science and Engineering C
Serial Year
2014
Journal title
Materials Science and Engineering C
Record number
2104552
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