• Title of article

    Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium

  • Author/Authors

    Hertl، نويسنده , , C. and Koll، نويسنده , , L. and Schmitz، نويسنده , , T. and Werner، نويسنده , , Jake E. and Gbureck، نويسنده , , U.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2014
  • Pages
    8
  • From page
    28
  • To page
    35
  • Abstract
    Titanium substrates were coated with tantalum layers of 5 μm thickness using physical vapour deposition (PVD). The tantalum layers showed a (110)-preferred orientation. The coated samples were hardened by oxygen diffusion. Using X-ray diffraction the crystallographic structure of the tantalum coatings was characterised, comparing untreated and diffusion hardened specimen conditions. Oxygen depth profiles were determined by glow discharge spectrometry. The hardening effect of the heat treatment was examined by Vickers microhardness testing. The increase of surface hardness caused by oxygen diffusion was at least 50%.
  • Keywords
    diffusion , Oxidation , Surface hardening , Magnetron sputtering , Physical vapour deposition , Metal surface treatment , Titanium
  • Journal title
    Materials Science and Engineering C
  • Serial Year
    2014
  • Journal title
    Materials Science and Engineering C
  • Record number

    2104552