• Title of article

    High temperature dynamic fatigue performance of a hot isostatically pressed silicon nitride

  • Author/Authors

    Wereszczak، نويسنده , , A.A. and Kirkland، نويسنده , , T.P. and Breder، نويسنده , , K. and Ferber، نويسنده , , M.K. and Khandelwal، نويسنده , , Pramod، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1995
  • Pages
    10
  • From page
    257
  • To page
    266
  • Abstract
    The dynamic fatigue performance of an injection molded, hot-isostatically pressed silicon nitride containing 6 wt.% yttrium oxide as a sintering aid was examined at 1000, 1200, and 1400 °C, in four-point flexure in ambient air and argon. This material was more susceptible to slow crack growth, as reflected by the slopes of the flexure strength vs. stressing rate curves, as the test temperature was increased in both environments. At the same temperature, this material was much more susceptible to slow crack growth in ambient air than in argon. Stress-corrosion cracking (and not creep damage) was the dominant damage mechanism, although the material crept at the slower stressing rates in both environments. Stress-corrosion cracking ultimately caused a reduction in strength.
  • Keywords
    Nitrogen , Fatigue , Hot Isostatic Pressing , Silicon
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    1995
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2130588