Title of article
Reactive ion etched quantum wire structures for laser applications
Author/Authors
Gurevich، نويسنده , , S.A. and Zakheim، نويسنده , , D.A. and Solovʹev، نويسنده , , S.A. and Fedorovich، نويسنده , , A.E. and Komin، نويسنده , , V.V. and Nesterov، نويسنده , , S.I. and Kochnev، نويسنده , , I.V. and Scopina، نويسنده , , V.I.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
4
From page
47
To page
50
Abstract
This work presents the results of an investigation of the properties of high quality InGaAs-GaAs strained quantum well wire (QWW) structures fabricated by means of the optimized reactive ion etching technique followed by special sample treatment and metallorganic chemical vapor deposition overgrowth. Both photoluminescence (PL) and electroluminescence features were studied. The one-dimensional nature of electron-hole gas in fabricated QWWs was proved by the observation of blue shift and polarization anisotropy of PL emission lines. High efficiency of QWW luminescence was demonstrated by comparison of integrated PL intensity of QWWs with that of an unpatterned reference quantum well sample. The electro-optical properties of QWW laser structures was found to be strongly dependent on the carrier capture process, which, in turn, is determined to a great extent by the quality of the regrowth interface.
Keywords
Optical properties , Etching , Quantum structures , Semiconductor devices
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1995
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2131251
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