Title of article :
Growth and characterization of strain-compensated InAsPGaInP and InGaAsGaInP multiple quantum wells
Author/Authors :
Tu، نويسنده , , C.W. and Mei، نويسنده , , X.B. and Yan، نويسنده , , C.H. and Bi، نويسنده , , W.G.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1995
Pages :
5
From page :
166
To page :
170
Abstract :
We have shown that strain compensation is effective in increasing the critical layer thickness or the critical number of periods in a multiple quantum well (MQW) structure and in improving thermal stability. Compared with a strain-uncompensated InAs0.4P0.6InP MQW (1.3% strain) on InP substrates, strain-compensated InAs0.4P0.6GayIn1 − yP MQW in a p-i-n structure exhibits superior structural and optical properties, especially electroabsorption characteristics that is suitable for modulator applications at 1.3 μm. Strain-compensated In0.3Ga0.7AsGayIn1 − yP MQWs on GaAs substrates exhibit better photoluminescence properties and are shown to be more thermally stable.
Keywords :
Photoluminescence , Quantum well , Molecular Beam Epitaxy , diffraction
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
1995
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2131275
Link To Document :
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