Title of article
Advantages of thin interfaces in step-graded buffer structures
Author/Authors
Gonzلlez، نويسنده , , D. and Araْjo، نويسنده , , D. and Gonzلlez، نويسنده , , L. and Gonzلlez، نويسنده , , Y. and Aragَn، نويسنده , , G. and Garcيa، نويسنده , , R.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
41
To page
45
Abstract
The effect of graded interfaces in step-graded buffer structures on crystal relaxation efficiency is investigated by transmission electron microscopy and double crystal X-ray diffraction. A higher recombination rate leading to higher edge dislocation densities and a strong diminution of the tilt, is evidenced when graded interfaces are used. The latter feature is a consequence of the poor stability of dislocation multiplication sources in graded interfaces. The lower strain energy release of dislocation segments and a diminution of the pinning points in graded interfaces reduce the lifetime of dislocations sources, producing a better distribution of Burgers vector in the misfit dislocations array.
Keywords
Double crystal X-ray diffraction , Misfit dislocations , Step-graded buffer structures , Transmission electron microscopy
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1997
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2132132
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