Title of article :
Advantages of thin interfaces in step-graded buffer structures
Author/Authors :
Gonzلlez، نويسنده , , D. and Araْjo، نويسنده , , D. and Gonzلlez، نويسنده , , L. and Gonzلlez، نويسنده , , Y. and Aragَn، نويسنده , , G. and Garcيa، نويسنده , , R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Abstract :
The effect of graded interfaces in step-graded buffer structures on crystal relaxation efficiency is investigated by transmission electron microscopy and double crystal X-ray diffraction. A higher recombination rate leading to higher edge dislocation densities and a strong diminution of the tilt, is evidenced when graded interfaces are used. The latter feature is a consequence of the poor stability of dislocation multiplication sources in graded interfaces. The lower strain energy release of dislocation segments and a diminution of the pinning points in graded interfaces reduce the lifetime of dislocations sources, producing a better distribution of Burgers vector in the misfit dislocations array.
Keywords :
Double crystal X-ray diffraction , Misfit dislocations , Step-graded buffer structures , Transmission electron microscopy
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Journal title :
MATERIALS SCIENCE & ENGINEERING: B