• Title of article

    Advantages of thin interfaces in step-graded buffer structures

  • Author/Authors

    Gonzلlez، نويسنده , , D. and Araْjo، نويسنده , , D. and Gonzلlez، نويسنده , , L. and Gonzلlez، نويسنده , , Y. and Aragَn، نويسنده , , G. and Garcيa، نويسنده , , R.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    5
  • From page
    41
  • To page
    45
  • Abstract
    The effect of graded interfaces in step-graded buffer structures on crystal relaxation efficiency is investigated by transmission electron microscopy and double crystal X-ray diffraction. A higher recombination rate leading to higher edge dislocation densities and a strong diminution of the tilt, is evidenced when graded interfaces are used. The latter feature is a consequence of the poor stability of dislocation multiplication sources in graded interfaces. The lower strain energy release of dislocation segments and a diminution of the pinning points in graded interfaces reduce the lifetime of dislocations sources, producing a better distribution of Burgers vector in the misfit dislocations array.
  • Keywords
    Double crystal X-ray diffraction , Misfit dislocations , Step-graded buffer structures , Transmission electron microscopy
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    1997
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2132132