Title of article :
Damage induced in materials by ion implantation
Author/Authors :
Mathur، نويسنده , , M.S. and McKee، نويسنده , , J.S.C. and Liu، نويسنده , , M. and He، نويسنده , , D.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
5
From page :
25
To page :
29
Abstract :
Surface damage caused in palladium and kapton by the implantation of 20 keV D2+ ions, fiuence- 1011 ions cm−2, has been investigated utilizing the technique of atomic force microscopy. TRIM program has been used to calculate the vacancies and interstitials created during implantation.
Keywords :
atomic force microscopy , Ion implantation , Surface damage
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
1997
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2132282
Link To Document :
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