Title of article :
GaN and AlGaN metal–semiconductor–metal photodetectors
Author/Authors :
Ferguson، نويسنده , , I and Tran، نويسنده , , C.A and Karlicek Jr، نويسنده , , R.F and Feng، نويسنده , , Z.C and Stall، نويسنده , , R and Liang، نويسنده , , S and Lu، نويسنده , , Y and Joseph، نويسنده , , C، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Abstract :
GaN based interdigital metal–semiconductor–metal (MSM) photodetectors have been successfully fabricated. The MSM structures were patterned on highly resistive GaN and the ternary compound, AlGaN. For the highly resistive GaN detector, the lowest dark current is ∼0.1 nA and the UV responsivity of the device was about 460 A W−1 at a DC bias of 5 V. The AlGaN with 24% Al exhibited larger gains of up to 106 A W−1 at 20 V, but at a very high dark current, 1 mA, and very long detector responses, greater than 60 s. The high gain in this device is not well understood. The preliminary measurements indicate that tunneling occurs at high electric fields since a negative temperature coefficient for the breakdown voltage was observed.
Keywords :
Metal–semiconductor–metal photodetectors , GaN , AlGaN
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Journal title :
MATERIALS SCIENCE & ENGINEERING: B