Title of article
Characterization of quantum structures by atomic-force microscopy
Author/Authors
Wüllner، نويسنده , , D and Schlachetzki، نويسنده , , A and Bِnsch، نويسنده , , P and Wehmann، نويسنده , , H.-H and Schrimpf، نويسنده , , T and Lacmann، نويسنده , , R and Kipp، نويسنده , , S، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
10
From page
178
To page
187
Abstract
After a short discussion of errors incurred during atomic-force microscopy (AFM), we suggest methods for calibration. We describe specifically designed standards fabricated by metal organic vapor-phase epitaxy (MOVPE) which are utilized as a basis to calibrate the AFM microscope against a mechanical surface profiler and a scanning electron microscope (SEM). An important prerequisite is a well controlled technique to prepare the surface of the sample for AFM. This is demonstrated for the case of InGaAs/InP.
Keywords
Calibration standards , InGaAs on InP , Quantum structures , Atomic-force microscopy
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1998
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2133015
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