Characterization of quantum structures by atomic-force microscopy

After a short discussion of errors incurred during atomic-force microscopy (AFM), we suggest methods for calibration. We describe specifically designed standards fabricated by metal organic vapor-phase epitaxy (MOVPE) which are utilized as a basis to calibrate the AFM microscope against a mechanical surface profiler and a scanning electron microscope (SEM). An important prerequisite is a well controlled technique to prepare the surface of the sample for AFM. This is demonstrated for the case of InGaAs/InP.