XPS study of plasma treated carbon layers deposited on porous silicon

A carbon film deposited on porous silicon in nitrogen plasma has been investigated by XPS. The presence of different carbon–nitrogen bonds in the whole carbonitride layer has been established. Irrespective of the low percentage of nitrogen (about 6%), it is found to participate in cyanide groups, bonds characteristic of β-C3N4 as well as in C–N and CN bonds.