• Title of article

    Oxygen diffusion in laser-ablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry

  • Author/Authors

    Span، نويسنده , , Edward A.F. and Wormeester، نويسنده , , Herbert and Blank، نويسنده , , Dave H.A. and Rogalla، نويسنده , , Horst، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    7
  • From page
    123
  • To page
    129
  • Abstract
    In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T≥300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.
  • Keywords
    oxygen diffusion , Laser-ablated , ellipsometry
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    1998
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2133452