Title of article
The initial stage of electron field emission from CVD diamond implanted with nitrogen
Author/Authors
Shao، نويسنده , , Lexi and Xie، نويسنده , , Erqing and He، نويسنده , , Deyan and Chen، نويسنده , , Guanghua، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
5
From page
83
To page
87
Abstract
Electron field emission characteristics from chemical vapor deposition (CVD) diamond thin films implanted with nitrogen have been investigated. It is shown that the formation of a stable emission from these films is characterized by a three-stage process of breakdown of the implanted layer, activation of the emitter and turn-on of the stable emission. On the basis of the experiment results, a modified activation model has been suggested to analyze the mechanisms of the emission.
Keywords
CVD diamond film , Nitrogen ion implantation , electron field emission , Activation model
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1999
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2134022
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