Epitaxial ZnO films on non-crystalline substrates

First results on a preparation of epitaxial ZnO films on non-crystalline substrates are presented. A two-step method is proposed to fabricate the single-crystalline ZnO films on non-crystalline substrates (alumina and fused silica). To secure the further autoepitaxy, a thin intermediate basis-oriented textured ZnO layer was deposited by a dc magnetron sputtering, as the first step. The epitaxial films prepared by CVD technique on the substrate with the buffer layer in the low pressure system feature high structural quality and smooth surface while the films prepared onto a clear substrate surface were polycrystalline.