Title of article
Hydrogen and doping issues in wide band gap semiconductors
Author/Authors
Chevallier، نويسنده , , J، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
7
From page
62
To page
68
Abstract
Hydrogen may be non-intentionally incorporated in wide band gap semiconductors when they are grown or processed under hydrogen-rich ambients. A possible consequence is a passivation of the dopants. The diffusion of hydrogen in boron doped diamond is presented to illustrate how hydrogen diffusion studies can evidence the existence of H-dopant interactions. Then, the hydrogen-dopant complexes will be investigated in wide band gap II–VI semiconductors and in GaN by infrared vibrational spectroscopy. Complex dissociation and dopant reactivation will finally be discussed together with hydrogen out-diffusion results.
Keywords
dopant , Local vibrational modes , Wide band gap semiconductors , Hydrogen , diffusion
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2000
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2135143
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