• Title of article

    Study of silver and copper diffusion in p-type Hg0.3Cd0.7Te and CdTe by capacitance measurements

  • Author/Authors

    Wartlick، نويسنده , , B.O. and Blanchard، نويسنده , , C. and Barbot، نويسنده , , J.F.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    254
  • To page
    257
  • Abstract
    A procedure to determine the diffusion coefficients of metallic impurities in p-type semiconductors is presented. This method, which rests on the analysis of the capacitance transient curve C(t) at various temperatures has been applied to the study of copper and silver diffusion in p-type Hg0.3Cd0.7Te and CdTe crystals. The as-found diffusion coefficients are in good agreement with existing results. The large activation energy of the silver diffusion coefficient, at low temperature, might come from the formation of a donor–acceptor complex.
  • Keywords
    silver , DEFECT , capacitance , diffusion , Copper , II–VI compounds
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2000
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2135194