• Title of article

    Comparison of electronic structure and properties of hydrogen-associated and thermal double donors in silicon

  • Author/Authors

    Tokmoldin، نويسنده , , S.Zh and Mukashev، نويسنده , , B.N. and Abdullin، نويسنده , , Kh.A and Gorelkinskii، نويسنده , , Yu.V and Pajot، نويسنده , , B، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    263
  • To page
    267
  • Abstract
    Infrared (IR) and electron paramagnetic resonance (EPR) studies of quenching-dependent hydrogen-related double donor (HDD) formed in proton-implanted n-Si and p-Si upon annealing above 300°C were carried out. IR data taken at liquid He and N2 reveal that quenching-dependent IR absorption lines is due to HDD electronic excitations. An analysis of Si–H local vibrational modes and EPR data on AA1 EPR center allow to conclude that HDD is an interstitial-type complex with C2v-symmetry. There are similarities in structures and properties of HDD and thermal double donors (TDD). However, uniaxial stress-induced alignment and recovery kinetics of HDD (AA1 EPR center) show strong difference in comparison with TDD (NL8 EPR center).
  • Keywords
    Silicon , Electronic structure , Shallow hydrogen-related double donor
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2000
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2135196