Photoluminescence characterization of defects created in electron-irradiated silicon at elevated temperatures

Photoluminescence (PL) spectroscopy is employed to investigate radiative defects created in Si during electron-irradiation at elevated temperatures. The use of high temperature during electron irradiation has been found to affect considerably the defect formation process. The effect critically depends on the temperature of the irradiation as well as doping of the samples. For carbon-lean Si wafers high temperature electron irradiation stimulates the formation of extended defects, such as dislocations and precipitates. For carbon-rich Si wafers the increase of irradiation temperature up to 300°C enhances the formation of the known carbon-related defects. In addition, several new excitonic PL lines were observed after electron irradiation at T≥450°C. The dominant new PL center gives rise to a BE PL emission at 0.961 eV. The electronic structure of the 0.961 eV defect is discussed based on temperature-dependent and magneto-optical studies.