Title of article
EPR study of He-implanted Si
Author/Authors
Pivac، نويسنده , , B and Rakvin، نويسنده , , B and Tonini، نويسنده , , R and Corni، نويسنده , , F and Ottaviani، نويسنده , , G، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
4
From page
60
To page
63
Abstract
Electron paramagnetic resonance has been used to study the influence of thermal treatments on defect evolution in helium-implanted Czochralski single-crystal silicon. It is shown that the thermal treatment induces helium migration and capturing by vacancy clusters that transform into pressurized bubbles. Such transformation produces a strain field, which in turn affects the dangling bond’s lineshape in its vicinity. It is shown that the strain field causes asymmetry of dangling bond lineshape that is proportional to the strain field. This selects the electron paramagnetic resonance as a convenient technique for the monitoring of the early phases of bubble formation.
Keywords
Silicon , Defects , Implantation
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2000
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2135276
Link To Document