• Title of article

    EPR study of He-implanted Si

  • Author/Authors

    Pivac، نويسنده , , B and Rakvin، نويسنده , , B and Tonini، نويسنده , , R and Corni، نويسنده , , F and Ottaviani، نويسنده , , G، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    60
  • To page
    63
  • Abstract
    Electron paramagnetic resonance has been used to study the influence of thermal treatments on defect evolution in helium-implanted Czochralski single-crystal silicon. It is shown that the thermal treatment induces helium migration and capturing by vacancy clusters that transform into pressurized bubbles. Such transformation produces a strain field, which in turn affects the dangling bond’s lineshape in its vicinity. It is shown that the strain field causes asymmetry of dangling bond lineshape that is proportional to the strain field. This selects the electron paramagnetic resonance as a convenient technique for the monitoring of the early phases of bubble formation.
  • Keywords
    Silicon , Defects , Implantation
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2000
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2135276