Title of article :
Surface roughness studies on 4H-SiC layers grown by liquid phase epitaxy
Author/Authors :
Kuznetsov، نويسنده , , N. and Tsagaraki، نويسنده , , K. and Bauman، نويسنده , , D. and Morozov، نويسنده , , A. and Nikitina، نويسنده , , I. and Ivantsov، نويسنده , , V. and Zekentes، نويسنده , , K.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
3
From page :
345
To page :
347
Abstract :
The surface roughness on 4H-SiC layers grown by LPE was systematically studied. The surface morphology was investigated by scanning electron microscopy and atomic force microscopy. Depending on the substrate orientation two different types of growth morphology were found: terraced and step flow growth. The height of growth steps was found to depend on the angle of the substrate off-orientation. The higher the degree of substrate off-orientation the higher the step height. The terrace height depends on the impurity concentration in LPE layers. With the decrease of the impurity level, the terrace height has been significantly decreased.
Keywords :
silicon carbide , liquid phase epitaxy , Surface roughness
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2001
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2136699
Link To Document :
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