Broad-band and flashlamp pumping of 1.53 μm emission from erbium-doped silicon nanocrystals

We report recent results showing broad-band excitation of erbium ions implanted into thin films of silica containing silicon nanocrystals. Evidence for the existence of nanocrystals is presented in the form of HR-TEM images of crystalline regions of the thin films. Indirect excitation of the rare-earth ions is mediated by the nanocrystals, which are either grown in during plasma enhanced CVD of the films, or are formed by implantation of thermally grown SiO2 layers with Si+ ions. We demonstrate efficient flashlamp pumping of the erbium 1.535 μm PL band and discuss the device implications of this material.