Title of article :
In situ interface characterization of silicon surface in fluoride media
Author/Authors :
Patel، نويسنده , , B.K. and Sahu، نويسنده , , S.N.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
4
From page :
914
To page :
917
Abstract :
The porous Si/HF-electrolyte junction has been studied by capacitance (C)–voltage (V) and current (I)–voltage (V) measurements. The observed current under forward bias shows an exponential increase like a Schottky diode with two oscillations around 1.0 and 2.4 V (SCE), respectively, whereas the reverse bias current shows negligible contribution. The low-frequency capacitance spectrum exhibits a peak structure in forward bias regime, which can be ascribed to the charge trapping/detrapping at Fermi level of porous Si under forward bias. The potential and charge distribution for a p-semiconductor/electrolyte junction is discussed
Keywords :
Silicon interface , Interface characterization , Fluoride media
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2001
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2136909
Link To Document :
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