Title of article :
Deep levels introduced in n-GaN grown by the ELOG technique by high-energy electron irradiation
Author/Authors :
Goodman، نويسنده , , S.A and Auret، نويسنده , , F.D and Myburg، نويسنده , , L and Legodi، نويسنده , , M.J and Gibart، نويسنده , , P and Beaumont، نويسنده , , B، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
3
From page :
95
To page :
97
Abstract :
We have used deep level transient spectroscopy (DLTS) to investigate the electron trap defects introduced in n-GaN grown, using the epitaxial lateral overgrowth technique during high-energy electron irradiation from a 90Sr radionuclide source. The results indicate that, apart from the major defect with an energy level at 0.20 eV below the conduction band (supposed to be related to the VN), at least four other defects with energy levels centered about 0.90±0.15 eV, are introduced. From modeling, ignoring temperature dependent capture cross-section effects we have determined their activation energies, and temperature independent capture cross sections, commonly known as the DLTS signature.
Keywords :
Electron trap defects , GaN , DLTS , electron irradiation
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2001
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2137034
Link To Document :
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