A model of texture formation in ZrO2 films

A model for predicting the texture development in monoclinic ZrO2 films grown on Zr alloys has been proposed. The model is based on assumptions of selective nucleation and anisotropic oxide grain growth. In this model during the stage of oxide nucleation, oxide and substrate lattice matching is the main factor influencing the orientation of nuclei. In the stage of oxide grain growth, the matching stress at oxide–metal interface plays a major role. The predicted oxide textures have been compared with the results from oxidation experiments performed on three samples obtained from different faces of the Zr–2.5% Nb pressure tube. A good agreement between the predicted oxide texture and the measured texture is observed. Texture analysis of the monoclinic oxide is based on the orientation distribution function (ODF).