Author/Authors :
Hao، نويسنده , , Xiaotao and Ma، نويسنده , , Jin and Zhang، نويسنده , , De-Heng and Yang، نويسنده , , Ying-Ge and Ma، نويسنده , , Hong-Lei and Cheng، نويسنده , , Chuan-Fu and Liu، نويسنده , , Xiang-Dong، نويسنده ,
Abstract :
Transparent conducting aluminum–doped zinc oxide (ZnO:Al) films have been prepared on polyimide (PI) and Corning 7059 substrates by r.f. magnetron sputtering technique at low substrate temperature (25–210 °C). Polycrystalline ZnO:Al films having a preferred orientation with the c-axis perpendicular to the substrate were deposited with resistivity as low as 8.5×10−4 Ω cm on PI substrates and 7.1×10−4 Ω cm on glass substrates. The average transmittance exceeded 74 and 85% in the visible spectrum for 360 and 390 nm thick films deposited on PI and glass, respectively. A comparison of the properties of the films deposited on glass and organic substrates was performed.
