Morphological investigation of the electrochemically etched GaAs (001) surface

In this paper, we investigate pattern formation on GaAs (001) surface after electrochemical layer removal by different aqueous HCl based electrolytes. Under polishing (non-selective) etching conditions the surface morphology displayed fractal behaviour. The morphological investigation of the surface was carried out using digital processing of scanning electron microscope images. The patterns were segmented by the so called grade of membership technique. Fractal properties were established using the box counting method.